M04900 - SEMI M49 - 130 nmから65 nmへの技術世代のシリコンウェーハ用ジオメトリ測定システム規定のためのガイド Revision:SEMI M49-0613 - Superseded SEMI E82-1102 (technical revision)

Name: M04900 - SEMI M49 - 130 nmから65 nmへの技術世代のシリコンウェーハ用ジオメトリ測定システム規定のためのガイド Revision:SEMI M49-0613 - Superseded SEMI E82-1102 (technical revision)
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Description

SEMI E82-1102 (technical revision)

SEMI E90-0999 (first published)

2% (1 × 1020 atoms/cm3) for antimony

especially predictive information

M04900 - SEMI M49 - 130 nmから65 nmへの技術世代のシリコンウェーハ用ジオメトリ測定システム規定のためのガイド Revision:SEMI M49-0613 - Superseded SEMI E82-1102 (technical revision)International Technology Roadmap for Semiconductors 1999 edition ITRS1309065 nmSEMI M1SEMI M8SEMI M11SEMI M24SEMI M38 Referenced SEMI Standards SEMI E1. 9 Mechanical Specification for Cassettes Used to Transport and Store 300 mm WafersSEMI E5 Specification for SEMI Equipment Communications Standard 2 Message Content (SECS II)SEMI E10 Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and

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